| 发明名称 | Metamaterial and method for forming a metamaterial using atomic layer deposition | ||
| 摘要 | A metamaterial includes a first continuous layer formed with a first material by atomic layer deposition (ALD), a first non-continuous layer formed with a second material by ALD on first upper surface portions of a first upper surface of the first continuous layer, and a second continuous layer formed with the first material by ALD on second upper surface portions of the first upper surface of the first continuous layer and on a second upper surface of the first non-continuous layer. | ||
| 申请公布号 | US9255328(B2) | 申请公布日期 | 2016.02.09 |
| 申请号 | US201414200198 | 申请日期 | 2014.03.07 |
| 申请人 | Robert Bosch GmbH | 发明人 | Purkl Fabian;Provine John;Yama Gary;Feyh Ando;O'Brien Gary |
| 分类号 | B32B3/02;C23C16/455 | 主分类号 | B32B3/02 |
| 代理机构 | Maginot Moore & Beck LLP | 代理人 | Maginot Moore & Beck LLP |
| 主权项 | 1. A metamaterial comprising: a first continuous layer formed with a first material by atomic layer deposition (ALD); a first non-continuous layer formed with a second material by ALD on first upper surface portions of a first upper surface of the first continuous layer; and a second continuous layer formed with the first material by ALD on second upper surface portions of the first upper surface of the first continuous layer and on a second upper surface of the first non-continuous layer. | ||
| 地址 | Stuttgart DE | ||