发明名称 Process for producing a repair coating on a coated metallic surface
摘要 A process for producing a repair coating on at least one metallic surface that is coated with at least one corrosion protecting coating A applied with at least one composition selected from the group of pretreatment compositions, of organic compositions and of silicon compound(s) containing compositions, whereby the at least one corrosion protecting coating A has been at least partially removed in the area Z, whereby a thin corrosion protecting coating B containing at least one silicon compound is applied with a solution or dispersion containing a silane, a silanol, a siloxane, or a polysiloxane on at least a part of the area Z. A further corrosion protecting coating C may be applied.
申请公布号 US9254507(B2) 申请公布日期 2016.02.09
申请号 US201213450729 申请日期 2012.04.19
申请人 CHEMETALL GMBH 发明人 Eriksson Mats;Walter Manfred
分类号 B05D7/26;B05D1/02;B05D3/00;B05D7/00;B05D5/00;B05D7/16;C09D5/08;C23C18/12;B05C1/00;B05C5/02;B05D7/14;C23C4/04;C23C26/02 主分类号 B05D7/26
代理机构 代理人 Kliebert Jeremy J.
主权项 1. A process for producing a repair coating on at least one metallic surface that has been previously coated with at least one corrosion protecting coating A which contains at least one silicon compound containing composition that is a solution or a dispersion containing at least one silicon compound that is not a polysiloxane selected from the group consisting of a silanol and a siloxane, and wherein the at least one corrosion protecting coating A has been at least partially removed in an area Z, by applying a corrosion protecting solution or dispersion B to at least a part of the area Z to form the repair coating on the area, wherein said corrosion protecting solution or dispersion B contains at least one silane, hydrolysis products thereof, condensation products thereof, reaction products thereof or mixtures thereof which are miscible with the components of the solution or dispersion B which are stable for at least several weeks, wherein the dry film has a thickness in the range from 0.001 to 3 μm.
地址 Frankfurt am Main DE