Defect inspection method and device thereof

摘要

A defect inspection device includes an irradiation unit for simultaneously irradiating different regions on a sample with illumination light under different optical conditions, the sample being predesigned to include patterns repeatedly formed thereupon, wherein the patterns are to be formed in the same shape; a detection unit for detecting, for each of the different regions, a beam of light reflected from each region irradiated with the illumination light; a defect candidate extraction unit for extracting defect candidates under the different optical conditions for each of the different regions, by processing detection signals corresponding to the reflected light which is detected; a defect extraction unit for extracting defects by integrating the defect candidates extracted under the different optical conditions; and a defect classifying unit for calculating feature quantities of the extracted defects and classifies the defects according to the calculated feature quantities.

主权项

1. A defect inspection device comprising:
irradiating unit which simultaneously irradiates different regions on a surface of a sample with illumination light under different optical conditions, on the surface of the sample patterns are repeatedly formed which are essentially having the same shape in design; detection unit which detects, for each of the different regions, light reflected from each region simultaneously irradiated with the illumination light under the different optical conditions by the irradiating unit; a first comparator which creates a first differential image from images of a first region under a first set of optical conditions; a second comparator which creates a second differential image from images of the first region under a second set of optical conditions; a differential image comparator which creates a third differential image based at least on the first differential image and the second differential image; a defect determination unit which determines defects based at least on feature quantities of the first differential image, feature quantities of the second differential image, and feature quantities of the third differential image; and defect classifying unit which classifies the defects.