发明名称 ガス濃度調整装置
摘要 The present invention is one that prevents standard gas from remaining in a standard gas line 3 to prevent a concentration of the standard gas from being reduced due to adsorption, modification, or the like of the standard gas, and has: a diluent gas line 2 that is provided with a diluent gas flow rate controlling mechanism 23; a standard gas line 3 that is provided with a standard gas flow rate controlling mechanism 33; an output gas line 4 that is joined by the diluent gas line 2 and standard gas line 3 and outputs the standard gas having a predetermined concentration; an exhaust gas line 5 that is connected to an upstream side of the standard gas flow rate controlling mechanism 33 in the standard gas line 3 and provided with an on/off valve and a flow rate control part; and a control part 6 that, depending on a flow rate of the standard gas flowing through the standard gas line 3 or the type of the standard gas, switches on/off of the on/off valve.
申请公布号 JP5855921(B2) 申请公布日期 2016.02.09
申请号 JP20110266384 申请日期 2011.12.06
申请人 株式会社堀場エステック 发明人 橋本 雄一郎;宮地 潤一
分类号 G01N1/00;B01F15/04;G01N1/22 主分类号 G01N1/00
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