发明名称 GAS BARRIER FILM
摘要 PROBLEM TO BE SOLVED: To provide a gas barrier film which is excellent in storage stability (especially storage stability under high temperature and high humidity condition).SOLUTION: A gas barrier film is formed by laminating an inorganic barrier layer on a resin substrate, in which the inorganic barrier layer is formed by a production method including: a step of preparing a coating liquid by making a raw material polysilazane compound and a metallic compound react with each other; a step of forming a coating film by applying the coating liquid onto the substrate and drying the coating liquid; and a step of conducting modification treatment by irradiating the coating film with vacuum-ultraviolet rays, and in which a degree of dispersion Mw/Mn, which is a ratio of a mass average molecular weight Mw and a number average molecular weight Mn of a part of the polysilazane compound, corresponding to the standard polystyrene with a number average molecular weight of 1,000 or more, included in the coating liquid, is 6 or less.SELECTED DRAWING: Figure 1
申请公布号 JP2016022602(A) 申请公布日期 2016.02.08
申请号 JP20140146329 申请日期 2014.07.16
申请人 KONICA MINOLTA INC 发明人 ITO HIROAKI;TAKEMURA CHIYOKO
分类号 B32B9/00;B05D7/04;B05D7/24;H01L31/048 主分类号 B32B9/00
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