| 摘要 |
PROBLEM TO BE SOLVED: To make roughness in a perpendicular direction to a circumferential direction absent, or to almost eliminate the existing roughness by polishing a gasket surface after molding a gasket shape that is laminated by a film.SOLUTION: A polishing is performed in a circumferential direction (a direction of a circle's perimeter) of a gasket 13 to obtain an effect of eliminating roughness existing in a perpendicular direction to the circumferential direction of the gasket 13. In polishing in the circumferential direction, the entire peak part is polished to obtain a uniform effect in the circumferential direction. A base material of a polishing agent for polishing after molding the gasket 13 in a polishing method is not specifically limited, but a base material comprising a fine polishing particle is used. Preferably, alumina, silicon carbide, or diamond is used for the fine polishing particle.SELECTED DRAWING: None |
