发明名称 FILM FORMATION METHOD, PIEZOELECTRIC ELEMENT, DROPLET DISCHARGE HEAD, DROPLET DISCHARGE DEVICE AND IMAGING DEVICE
摘要 PROBLEM TO BE SOLVED: To form a dense ferroelectric film with high orientation at low cost while suppressing the reduction in throughput in mass production.SOLUTION: A film formation method comprises: forming an orientation-control film 18 on a substrate by a coating step for forming a precursor solution coating film by coating with a precursor solution with solid contents dispersed therein for forming a crystal film, a heating step for heating the precursor solution coating film, and a crystallization step for heating at a temperature higher than a heating temperature in the heating step, thereby forming the crystal film; and then, forming a ferroelectric film 25 on the orientation-control film by a coating step, a heating step and a crystallization step. The particle diameter of the solid content at the maximum peak of a particle diameter distribution of the solid contents dispersed in the precursor solution used in forming the orientation-control film is larger than that of the precursor solution used in forming the ferroelectric film.SELECTED DRAWING: Figure 6
申请公布号 JP2016025313(A) 申请公布日期 2016.02.08
申请号 JP20140150788 申请日期 2014.07.24
申请人 RICOH CO LTD 发明人 UEDA KEIJI
分类号 H01L41/319;B41J2/14;B41J2/16;C01G23/00;C01G25/00;H01L41/09;H01L41/318 主分类号 H01L41/319
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