| 摘要 |
PROBLEM TO BE SOLVED: To provide a simplified method of patterning a transparent conductive film, which can perform an etching step for patterning a transparent conductive layer without forming a resist film.SOLUTION: The patterning method, which removes a part of a transparent conductive film formed on a film substrate 1 to form a pattern, comprises the steps of: forming an amorphous transparent conductive layer 4 on the film substrate 1; crystallizing the amorphous transparent conductive layer 4 in a pattern by irradiation with a laser beam; and removing the amorphous transparent conductive layer 4 with an etchant while leaving a crystallized transparent conductive layer 7.SELECTED DRAWING: Figure 1 |
