发明名称 |
PROTECTIVE FILM FOR POWER SEMICONDUCTOR ELEMENT, AND METHOD FOR FORMING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a protective film for a power device which is high in all of voltage resistance, volume resistivity in a high temperature and high humidity state, and chemical resistance, maintains these performances over a long period, and is excellent in reliability and durability.SOLUTION: A protective film for a power semiconductor element is obtained by curing a polybenzoxazole precursor having a repeating unit expressed by the formula (1). In formula (1), nand nare each independently integers of 0-2; Xis a divalent organic group; Yis a (2+n+n)-valent organic group; and Rare each independently H or C1-10 hydrocarbon groups.SELECTED DRAWING: None |
申请公布号 |
JP2016023226(A) |
申请公布日期 |
2016.02.08 |
申请号 |
JP20140147915 |
申请日期 |
2014.07.18 |
申请人 |
ASAHI KASEI E-MATERIALS CORP |
发明人 |
YONETANI MASAKI;OKUDA TOSHIAKI |
分类号 |
C08G14/073;G03F7/023;G03F7/09;G03F7/40;H01L21/027;H01L21/312;H01L21/768;H01L23/532 |
主分类号 |
C08G14/073 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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