发明名称 PROTECTIVE FILM FOR POWER SEMICONDUCTOR ELEMENT, AND METHOD FOR FORMING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a protective film for a power device which is high in all of voltage resistance, volume resistivity in a high temperature and high humidity state, and chemical resistance, maintains these performances over a long period, and is excellent in reliability and durability.SOLUTION: A protective film for a power semiconductor element is obtained by curing a polybenzoxazole precursor having a repeating unit expressed by the formula (1). In formula (1), nand nare each independently integers of 0-2; Xis a divalent organic group; Yis a (2+n+n)-valent organic group; and Rare each independently H or C1-10 hydrocarbon groups.SELECTED DRAWING: None
申请公布号 JP2016023226(A) 申请公布日期 2016.02.08
申请号 JP20140147915 申请日期 2014.07.18
申请人 ASAHI KASEI E-MATERIALS CORP 发明人 YONETANI MASAKI;OKUDA TOSHIAKI
分类号 C08G14/073;G03F7/023;G03F7/09;G03F7/40;H01L21/027;H01L21/312;H01L21/768;H01L23/532 主分类号 C08G14/073
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