POLISHER, POLISHER SET AND SUBSTRATE POLISHING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a polisher which can polish silicon nitride at a high polishing rate and can also sufficiently reduce the polishing rate of silicon oxide.SOLUTION: A polisher comprises a liquid medium, an abrasive grain comprising hydroxide of a tetravalent metal element, a nonionic compound, and dicyandiamide-formaldehyde polycondensate.SELECTED DRAWING: None