发明名称 ALUMINUM FILM AND FILM DEPOSITION METHOD THEREFOR
摘要 PROBLEM TO BE SOLVED: To provide an aluminum film and a film deposition method therefor such that even when a film thickness is made thin, solar light condensed to have higher energy density never reaches a film-deposited member made of a resin material, and manufacturing cost can be made low by making the film thickness thin.SOLUTION: In a series of film deposition processes from the start to the end of film deposition, an aluminum film 1 is laminated and formed on a film-deposited member 10 made of a resin material by repeating a plurality of times of sputtering with a standby time interposed. Consequently, an aluminum film 1 is deposited which has a multi-layered structure comprising a first aluminum film 21 and a second aluminum film 22 having mutual border surfaces serving as a discontinuous plane 25 acting for light shielding and heat insulation.SELECTED DRAWING: Figure 2
申请公布号 JP2016023331(A) 申请公布日期 2016.02.08
申请号 JP20140147864 申请日期 2014.07.18
申请人 STANLEY ELECTRIC CO LTD 发明人 YOSHIDA MAKOTO;SUZUKI YOSHIO;SHINNO CHIKASHI
分类号 C23C14/14;C23C14/34;F21S8/10;G02B5/08 主分类号 C23C14/14
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