| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing composition which can improve a polishing rate while achieving excellent surface quality.SOLUTION: There is provided a polishing composition comprising silica particles as abrasive grains, and a basic compound as a polishing promoter. A ratio of a total surface area A of the abrasive grains [m/kg composition] to a total volume B of the abrasive grains [m/kg composition] included in the polishing composition 1 kg, A/B, is 7.0×10or more.SELECTED DRAWING: None |
