DEPOSITION APPARATUS AND METHOD FOR FLAT PANEL DISPLAY DEVICE

摘要

Disclosed are a deposition apparatus and a deposition method for a flat panel display device which deposit a thin film on a substrate for a flat panel display device and improve deposition quality. The deposition apparatus for a flat panel display device comprises: a substrate support unit on which a substrate is seated; a process chamber providing a deposition space in which the substrate is accommodated to perform a deposition process; a gas spray head disposed on an upper portion of the process chamber to inject deposition gas into the deposition space, and provided with a plurality of gas inlet units to allow the deposition gas to flow in parallel with the substrate; and a plasma generation unit disposed above the gas spray head in parallel with the gas spray head to provide plasma by a capacitively coupled plasma (CCP) method.