| 摘要 |
Provided is a method for manufacturing a gold nanostructure. More specifically, the method comprises the following steps: forming a gold (Au) seed layer on a substrate; forming a micropattern layer, on which some areas of the gold (Au) seed layer are exposed, on the Au seed layer; conducting a primary electrochemical deposition process on the substrate while supplying a gold salt solution so as to form a first gold nanostructure, prepared by depositing gold particles of the gold salt solution on the Au seed layer exposed by the micropattern layer; selectively removing the micropattern layer; conducting a secondary electrochemical deposition process on the substrate while supplying the gold salt solution so as to form a second gold nanostructure, prepared by additionally depositing gold particles of the gold salt solution on the first gold nanostructure formed on the Au seed layer. Accordingly, the present invention can easily manufacture the gold nanostructure having a three-dimensional nanosurface by using an electrochemical deposition method. In addition, a flower-shaped gold nanostructure has a wide surface area by a structural feature thereof, thereby being widely used for an electrode, a sensor, etc. which require high sensitivity. |
