发明名称 SILICONE STRUCTURE-BEARING POLYMER, NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM, PATTERNING PROCESS, AND ELECTRIC/ELECTRONIC PART-PROTECTING FILM
摘要 A silicone structure-bearing polymer comprising recurring units derived from a bis(4-hydroxy-3-allylphenyl) derivative and having a Mw of 3,000-500,000 is provided. A chemically amplified negative resist composition comprising the polymer overcomes the stripping problem that a coating is stripped from metal wirings of Cu or Al, electrodes, and SiN substrates.
申请公布号 US2016033865(A1) 申请公布日期 2016.02.04
申请号 US201514807072 申请日期 2015.07.23
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 Takemura Katsuya;Urano Hiroyuki;Iio Masashi;Fujiwara Takayuki;Hasegawa Koji
分类号 G03F7/075;G03F7/20;C07C39/21;G03F7/32;G03F7/40;C08G77/12;G03F7/16;G03F7/38 主分类号 G03F7/075
代理机构 代理人
主权项 1. A silicone structure-bearing polymer comprising recurring units of the general formula (1) and having a weight average molecular weight of 3,000 to 500,000,wherein R1 to R4 are each independently a monovalent C1-C8 hydrocarbon group, m is an integer of 1 to 100, a, b, c and d are each independently 0 or a positive number, e and f each are a positive number, and a+b+c+d+e+f=1, X is an organic group having the general formula (2):wherein Z is a divalent organic group selected from the group consisting ofthe broken line segment denotes a valence bond, n is 0 or 1, R5 and R6 are each independently a C1-C4 alkyl or alkoxy group, k is 0, 1 or 2, Y is an organic group having the general formula (3):wherein V is a divalent organic group selected from the group consisting ofthe broken line segment denotes a valence bond, p is 0 or 1, R7 and R8 are each independently a C1-C4 alkyl or alkoxy group, h is 0, 1 or 2, and W is an organic group having the general formula (4):wherein the broken line segment denotes a valence bond, R is hydrogen or a straight or branched C1-C6 alkyl group, and T is a straight, branched or cyclic C1-C12 alkylene group.
地址 Tokyo JP