| 发明名称 |
ILLUMINATION APPARATUS FOR A PROJECTION EXPOSURE SYSTEM |
| 摘要 |
For controlling an intensity distribution of an illumination radiation (3) impinging on an object field, an illumination apparatus (35) for a projection exposure apparatus for microlithography comprises a means for spatially displacing an illumination beam (9i) relative to a first facet mirror of an illumination optical unit. |
| 申请公布号 |
WO2016016453(A1) |
申请公布日期 |
2016.02.04 |
| 申请号 |
WO2015EP67728 |
申请日期 |
2015.07.31 |
| 申请人 |
CARL ZEISS SMT GMBH |
发明人 |
PATRA, MICHAEL;DEGÜNTHER, MARKUS |
| 分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
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