发明名称 MANUFACTURING METHOD OF IMPRINT MOLD
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of an imprint mold capable of removing a foreign substance deposited on a pattern formation surface of a manufactured imprint mold without generating missing or the like in fine uneven patterns on the imprint mold.SOLUTION: The manufacturing method of the imprint mold includes: applying etching processing to an imprint mold substrate which includes a first surface and a second surface confronting the first surface and with which a metal film pattern is provided at the side of the first surface, and forming the fine uneven patterns on the first surface side of the imprint mold substrate; inspecting the presence/absence of the foreign substance on the first surface side of the imprint mold substrate with which the fine uneven patterns are formed; making a region including the foreign substance on the first surface side of the imprint mold substrate into contact with an active energy ray-curable resin ; semi-curing the active energy ray-curable resin and isolating the imprint mold substrate from the semi-cured active energy ray-curable resin.SELECTED DRAWING: Figure 2
申请公布号 JP2016021468(A) 申请公布日期 2016.02.04
申请号 JP20140144115 申请日期 2014.07.14
申请人 DAINIPPON PRINTING CO LTD 发明人 ITO KIMIO
分类号 H01L21/027;B29C33/38;B29C59/02 主分类号 H01L21/027
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