发明名称 |
MANUFACTURING METHOD OF IMPRINT MOLD |
摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method of an imprint mold capable of removing a foreign substance deposited on a pattern formation surface of a manufactured imprint mold without generating missing or the like in fine uneven patterns on the imprint mold.SOLUTION: The manufacturing method of the imprint mold includes: applying etching processing to an imprint mold substrate which includes a first surface and a second surface confronting the first surface and with which a metal film pattern is provided at the side of the first surface, and forming the fine uneven patterns on the first surface side of the imprint mold substrate; inspecting the presence/absence of the foreign substance on the first surface side of the imprint mold substrate with which the fine uneven patterns are formed; making a region including the foreign substance on the first surface side of the imprint mold substrate into contact with an active energy ray-curable resin ; semi-curing the active energy ray-curable resin and isolating the imprint mold substrate from the semi-cured active energy ray-curable resin.SELECTED DRAWING: Figure 2 |
申请公布号 |
JP2016021468(A) |
申请公布日期 |
2016.02.04 |
申请号 |
JP20140144115 |
申请日期 |
2014.07.14 |
申请人 |
DAINIPPON PRINTING CO LTD |
发明人 |
ITO KIMIO |
分类号 |
H01L21/027;B29C33/38;B29C59/02 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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