STENCIL MASK, PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

摘要

PROBLEM TO BE SOLVED: To form a desired pattern in an electrostatic chuck by easily conveying a mask onto the electrostatic chuck and disposing the mask thereon.SOLUTION: A stencil mask includes: a first mask with which the desired pattern is formed; a second mask which is disposed in an outer peripheral part of the first mask while being spaced apart from the first mask by a predetermined gap; and bridge members of which one end is connected with the first mask and the other end is connected with the second mask and which bridge the first and second masks at positions higher than the first and second masks. The first and second masks are bridged at three or more positions by the three or more bridge members and integrated.SELECTED DRAWING: Figure 2