发明名称 ENVIRONMENTAL SYSTEM INCLUDING DECOMPRESSION DISCHARGE FOR IMMERSION LITHOGRAPHY DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an environment system for controlling an environment of a gap between an optic assembly and a device.SOLUTION: A fluid barrier (254) is positioned in the vicinity of a device (30), and an immersion fluid system (252) supplies an immersion fluid (248) for filling a gap (246). The immersion fluid system (252) recovers the immersion fluid (248) directly existing between the fluid barrier (254) and the device (30), the fluid barrier (254) may include a discharge inlet positioned in the vicinity of the device (30), and the immersion fluid system (252) may include a low pressure source communicated to the discharge inlet. An environmental system (26) includes a bearing fluid source for directing a bearing fluid to between the fluid barrier (254) and the device (30).SELECTED DRAWING: Figure 2B
申请公布号 JP2016021079(A) 申请公布日期 2016.02.04
申请号 JP20150218810 申请日期 2015.11.06
申请人 NIKON CORP 发明人 HAZELTON ANDREW J;SOGARD MICHAEL
分类号 G03F7/20 主分类号 G03F7/20
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