Substituted Silacyclopropane Precursors And Their Use For The Deposition Of Silicon-Containing Films

摘要

Provided are silacyclopropane-based compounds and methods of making the same. Also provided are methods of using said compounds in film deposition processes to deposit films comprising silicon. Certain methods comprise exposing a substrate surface to a silacyclopropane-based precursor and a co-reagent in various combinations.

主权项

1. A compound having a structure represented by formula (IIIA-B), (IVA-B) or (VA-B): wherein R1 and R2 are each methyl, and each of R3-12 is independently hydrogen, or a linear, branched or cyclic alkyl group with C1-9, and n ranges from 2 to 6.