| 发明名称 |
EXTREME UV LIGHT GENERATION APPARATUS |
| 摘要 |
An extreme ultraviolet light generation apparatus includes a target supplier configured to output a target into a chamber as a droplet, the target generating extreme ultraviolet light when being irradiated with a laser beam in the chamber; a droplet measurement unit configured to measure a parameter for a state of the droplet outputted into the chamber; a pressure regulator configured to regulate a pressure in the target supplier in which the target is accommodated; and a target generation controller configured to control the pressure regulator, based on the parameter measured by the droplet measurement unit. |
| 申请公布号 |
US2016037616(A1) |
申请公布日期 |
2016.02.04 |
| 申请号 |
US201514879754 |
申请日期 |
2015.10.09 |
| 申请人 |
Gigaphoton Inc. |
发明人 |
SAITO Takashi;IWAMOTO Fumio;WAKABAYASHI Osamu;YABU Takayuki |
| 分类号 |
H05G2/00 |
主分类号 |
H05G2/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An extreme ultraviolet light generation apparatus comprising:
a target supplier configured to output a target into a chamber as a droplet, the target generating extreme ultraviolet light when being irradiated with a laser beam in the chamber; a droplet measurement unit configured to measure a predetermined measured number or passing number of parameters for a state of the droplet outputted into the chamber; a pressure regulator configured to regulate a pressure in the target supplier in which the target is accommodated; and a target generation controller configured to control the pressure regulator, based on an average value of the predetermined measured number or passing number of parameters measured by the droplet measurement unit. |
| 地址 |
Tochigi-ken JP |
