发明名称 CHARGED PARTICLE BEAM DEVICE, SIMULATION METHOD, AND SIMULATION DEVICE
摘要 The simulation device calculates by simulation the number of electrons detected originating from a sample irradiated with charged particles, and generates a simulation image of the sample. The simulation device retains penetration length information (272), which associates the entrance conditions of charged particles with the penetration length, sample constitution information (271), which indicates the constitution of the sample, and released electron number information, which associates the entrance conditions of the charged particles with the number of electrons released. Based on the entrance conditions at a predetermined entry point, the penetration length information (272), the sample constitution information (271), and the released electron number information, the simulation device calculates the number of electrons released from the predetermined entry point.
申请公布号 WO2016016927(A1) 申请公布日期 2016.02.04
申请号 WO2014JP69815 申请日期 2014.07.28
申请人 HITACHI, LTD. 发明人 BIZEN, DAISUKE;SAKAKIBARA, MAKOTO;OHTA, HIROYA;TANAKA, JUNICHI
分类号 H01J37/22;H01J37/28 主分类号 H01J37/22
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