发明名称 AUTOBAHN INTERCONNECT IN IC WITH MULTIPLE CONDUCTION LANES
摘要 A topological insulator is grown on an IC wafer in a vacuum chamber as a thin film interconnect between two circuits in the IC communicating with each other. As the TI is being grown, magnetic doping of the various TI sub-layers is varied to create different edge states in the stack of sub-layers. The sub-edges conduct in parallel with virtually zero power dissipation. Conventional metal electrodes are formed on the IC wafer that electrically contact the four corners of the TI layer (including the side edges) to electrically connect a first circuit to a second circuit via the TI interconnect. The TI interconnect thus forms two independent conducting paths between the two circuits, with each path being formed of a plurality of sub-edges. This allows bi-direction communications without collisions. Since each electrode contacts many sub-edges in parallel, the overall contact resistance is extremely low.
申请公布号 US2016035674(A1) 申请公布日期 2016.02.04
申请号 US201414447499 申请日期 2014.07.30
申请人 The Board of Trustees of the Leland Stanford Junior University 发明人 Zhang Shoucheng;Wang Jing
分类号 H01L23/532;H01L23/528 主分类号 H01L23/532
代理机构 代理人
主权项 1. An electrical circuit comprising: a first circuit (22) generating a first current signal; a second circuit (24) generating a second current signal; a magnetically doped, topological insulator (26) formed of a plurality of layers (26A-26X), each layer of the topological insulator having conductive edges with insulating properties between the edges, a first edge of the topological insulator forming a first set of edges of the layers, and a second edge of the topological insulator forming a second set of edges of the layers; a first electrode contacting the first set of edges; a second electrode contacting the second set of edges; the first current signal being coupled to the first electrode; and the second current signal being coupled to the second electrode, wherein the first set of edges of the topological insulator comprises a first plurality of separate conduction paths, wherein the first plurality of separate conduction paths are electrically connected in parallel by the first electrode, and wherein the second set of edges of the topological insulator comprises a second plurality of separate conduction paths, wherein the second plurality of separate conduction paths are electrically connected in parallel by the second electrode.
地址 Stanford CA US