发明名称 HIGH GAIN DURABLE ANTI-REFLECTIVE COATING
摘要 Disclosed herein are polysilsesquioxane-based anti-reflective coating (ARC) compositions, methods of preparation, and methods of deposition on a substrate. In one embodiment, the polysilsesquioxane of this disclosure is prepared in a two-step process of acid catalyzed hydrolysis of organoalkoxysilane followed by addition of tetralkoxysilane that generates silicone polymers with >40 mol % silanol based on Si-NMR. These high silanol siloxane polymers are stable and have a long shelf-life in polar organic solvents at room temperature. Also disclosed are low refractive index ARC made from these compositions with and without additives such as porogens, templates, thermal radical initiator, photo radical initiators, crosslinkers, Si—OH condensation catalyst and nano-fillers. Also disclosed are methods and apparatus for applying coatings to flat substrates including substrate pre-treatment processes, coating processes and coating curing processes including skin-curing using hot-air knives. Also disclosed are coating compositions and formulations for highly tunable, durable, highly abrasion-resistant functionalized anti-reflective coatings.
申请公布号 US2016032147(A1) 申请公布日期 2016.02.04
申请号 US201514799507 申请日期 2015.07.14
申请人 Enki Technology, Inc. 发明人 Maghsoodi Sina;Brophy Brenor L.;Colson Thomas E.;Gonsalves Peter R.;Abrams Ze'ev R.
分类号 C09D183/08;G02B1/12;C03C17/30;H01L33/00;H01L31/0216;H01L31/18;G02B1/111;H01L33/44 主分类号 C09D183/08
代理机构 代理人
主权项 1. A siloxane polymer solution composition, comprising: (i) a siloxane polymer A formed from acid hydrolyzed alkoxysilane, organosilane, and organofluorosilane, wherein the siloxane polymer A has the following formula: [RSi(OH)2O0.5]a[RSiO1.5]b[RSi(OH)O]c[R′Si(OH)2O0.5]m[R′SiO1.5]n[R′Si(OH)O]p[SiO2]w[Si(OH) O1.5]x[Si(OH)2O]y[Si(OH)3O0.5]z, where R is selected from the group consisting of independently methyl or optionally substituted or unsubstituted C2 to C10 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C1 to C10 hydroxyalkyl group, a substituted or unsubstituted C6 to C20 aryl group, a substituted or unsubstituted C2 to C20 heteroaryl group, a substituted or unsubstituted C2 to C10 alkenyl group, a substituted or unsubstituted carboxyl group, a substituted or unsubstituted (meth)acryl group a substituted or unsubstituted glycidylether group, or a combination thereof, R′ is selected from the group consisting of a fluorine substituted C3 alkyl group or optionally C4 to C10 alkyl group, a fluorine substituted C3 to C20 cycloalkyl group, a fluorine substituted C1 to C10 hydroxyalkyl group, a fluorine substituted aryl group, a fluorine substituted C2 to C20 heteroaryl group, a fluorine substituted C2 to C10 alkenyl group, a fluorine substituted carboxyl group, a substituted or unsubstituted (meth)acryl group, a fluorine substituted glycidylether group, or a combination thereof, 0<a,b,c,w,x,y,z<0.9, 0≦m,n,p<0.9, and a+b+c+m+n+p+w+x+y+z=1; (ii) a hydrolysis acid catalyst; (iii) a polar organic solvent; and (iv) at least one additive selected from the group consisting of: a thermal radical initiator, a photo radical initiator and a crosslinker.
地址 San Jose CA US