发明名称 SEMICONDUCTOR DEVICE
摘要 A transistor includes a multilayer film in which an oxide semiconductor film and an oxide film are stacked, a gate electrode, and a gate insulating film. The multilayer film overlaps with the gate electrode with the gate insulating film interposed therebetween. The multilayer film has a shape having a first angle between a bottom surface of the oxide semiconductor film and a side surface of the oxide semiconductor film and a second angle between a bottom surface of the oxide film and a side surface of the oxide film. The first angle is acute and smaller than the second angle. Further, a semiconductor device including such a transistor is manufactured.
申请公布号 US2016035567(A1) 申请公布日期 2016.02.04
申请号 US201514878399 申请日期 2015.10.08
申请人 Semiconductor Energy Laboratory Co., Ltd. 发明人 SATO Takahiro;NAKAZAWA Yasutaka;CHO Takayuki;KOSHIOKA Shunsuke;TOKUNAGA Hajime;JINTYOU Masami
分类号 H01L21/02;H01L21/306;H01L27/12;H01L29/66 主分类号 H01L21/02
代理机构 代理人
主权项 1. (canceled)
地址 Atsugi-Shi JP