发明名称 |
SEMICONDUCTOR DEVICE |
摘要 |
A semiconductor device includes a plurality of bit lines that intersect an active region on a substrate and extend in a first direction, a contact pad formed on the active region between adjacent bit lines, and a plurality of spacers disposed on sidewalls of the plurality of bit lines. An upper portion of the contact pad is interposed between adjacent spacers, and a lower portion of the contact pad has a width greater than a distance between adjacent spacers. |
申请公布号 |
US2016035714(A1) |
申请公布日期 |
2016.02.04 |
申请号 |
US201514875385 |
申请日期 |
2015.10.05 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM KEUN-NAM;PARK SUN-YOUNG;SHIN SOO-HO;YEOM KYE-HEE;JANG HYEON-WOO;JEONG JIN-WON;CHO CHANG-HYUN;HONG HYEONG-SUN |
分类号 |
H01L27/02;H01L23/528;H01L23/532 |
主分类号 |
H01L27/02 |
代理机构 |
|
代理人 |
|
主权项 |
1. A semiconductor device comprising:
a first bit line intersecting an active region on a substrate, the first bit line extending in a first direction; a second bit line on the substrate, the second bit line being spaced apart from the first bit line and extending in the first direction; a buried insulation layer between the substrate and the second bit line, the buried insulation layer extending in the first direction; a first spacer structure on a sidewall of the first bit line; a second spacer structure on a sidewall of the second bit line; and a contact pad on the substrate, the contact pad being between the buried insulation layer and a lower portion of the first spacer structure. |
地址 |
SUWON-SI KR |