REMOTE PLASMA CLEAN SOURCE FEED BETWEEN BACKING PLATE AND DIFFUSER

摘要

Embodiments of the present disclosure provide an apparatus having a remote plasma clean source in which the remote plasma clean source delivers radicals from the remotely generated plasma to the chamber at a location disposed between a backing plate and a diffuser.

主权项

1. An apparatus, comprising:
a chamber body; a gas distribution plate disposed in the chamber body; a backing plate disposed in the chamber body and spaced from the gas distribution plate; a blocker plate assembly disposed within chamber body between the gas distribution plate and the backing plate; and a remote plasma clean source coupled to the chamber body, wherein the remote plasma clean source has at least one outlet in the chamber body and wherein the at least one outlet is disposed between the gas distribution plate and the blocker plate assembly.