METHOD FOR PRODUCING POLISHING SLURRY, POLISHING ABRASIVE GRAINS, POLISHING SLURRY, AND METHOD FOR PRODUCING GLASS SUBSTRATE

摘要

Provided are a method for producing a polishing slurry, polishing abrasive grains, and a polishing slurry with which polishing rate can be improved and the occurrence of damage to a glass substrate can be suppressed. Further provided is a method for producing a glass substrate using such a polishing slurry and polishing abrasive grains. This method for producing a polishing slurry including polishing abrasive grains is used in the polishing treatment of a glass substrate and is characterized by comprising: an addition process in which a binder is added to a raw material slurry that includes raw material abrasive grains which constitute the raw material for the polishing abrasive grains; a drying process in which the raw material slurry which includes the binder is dried to produce a mass of raw material abrasive grains containing the binder; and a sintering process in which the mass of raw material abrasive grains is sintered to produce an aggregate of raw material abrasive grains containing the binder.