| 摘要 |
Provided are: a Penning-discharge ion gun capable of thinly focusing a beam at a low acceleration voltage and low ion-beam current; an ion-milling device having said ion gun; and an ion-milling method. An ion-milling device for controlling the range of the half-value width of the beam profile of an ion beam (2) irradiated from an ion gun (1) at a specimen (6) to 200-350μm, and having the ion gun (1) for discharging an ion beam by ionizing externally supplied gas, a gas-flow adjustment unit (40) capable of varying the flow of gas to be supplied to the ion gun (1), and a current measurement unit (50) for measuring the current value of the ion beam (2) discharged from the ion gun (1), the ion-milling device being characterized in that the gas-flow adjustment unit (40) sets the gas flow to a value higher than the gas flow at which the ion beam current is at the maximum, on the basis of the gas flow set by the gas-flow adjustment unit (40) and the current value measured by the current measurement unit (50). |
