| 摘要 |
PROBLEM TO BE SOLVED: To provide a mask inspection device and a mask inspection method capable of creating a reference image having high accuracy, and improving inspection accuracy, using an optical image which is collected in advance, in a whole image collection inspection method.SOLUTION: A reference image created on a reference circuit 14 is stored in a buffer memory 15a, and an optical image collected by an optical image acquisition part 101 is stored in a buffer memory 15b. A reference image learning/creation estimation re-configuration circuit 15c determines defects based on difference of a comparison result of the reference image and the optical image in a specific area, and when a defect number is larger than a predetermined threshold, uses a reference image learning/creation point candidate to re-configure reference image learning/creation estimation of the reference image stored in the buffer memory 15a. The reference image stored in the buffer memory 15a with the re-configured reference image learning/creation estimation and the optical image stored in the buffer memory 15b are input to a comparison circuit 15d, and comparison in off-line is executed.SELECTED DRAWING: Figure 5 |
