发明名称 SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURING THE SAME, AND POWER MODULE
摘要 A semiconductor device includes an n-type drain layer, an n-type base layer provided on the n-type drain layer, a p-type base layer and an n-type source layer partially formed in surface layer portions of the n-type base layer and the p-type base layer, respectively, a gate insulation film formed on a surface of the p-type base layer between the n-type source layer and the n-type base layer, a gate electrode formed on the gate insulation film facing the p-type base layer across the gate insulation film, a p-type column layer formed within the n-type base layer to extend from the p-type base layer toward the n-type drain layer, a depletion layer alleviation region arranged between the p-type column layer and the n-type drain layer and including first baryons converted to donors, a source electrode connected to the n-type source layer, and a drain electrode connected to the n-type drain layer.
申请公布号 US2016035824(A1) 申请公布日期 2016.02.04
申请号 US201514876795 申请日期 2015.10.06
申请人 ROHM CO., LTD. 发明人 NAKAJIMA Toshio
分类号 H01L29/06;H01L21/265;H02P27/06;H01L27/088;H02M7/5387;H02P6/14;H01L29/66;H01L21/324 主分类号 H01L29/06
代理机构 代理人
主权项 1. A method of manufacturing a semiconductor device, comprising: forming an first conductivity base layer on an first conductivity drain layer; partially forming a second conductivity base layer in a surface layer portion of the first conductivity base layer; forming a second conductivity column layer within the first conductivity base layer, the second conductivity column layer extending from the second conductivity base layer toward the first conductivity drain layer; forming a first dose region n between the second conductivity column layer and the first conductivity drain layer within the first conductivity base layer by irradiating first charged particles at a rear surface side of the drain layer and then converting the first charged particles to donors through heat treatment at a predetermined temperature; and forming a second dose region within the first dose region by irradiating second charged particles at the rear surface side of the first conductivity drain layer, the second charged particles heavier than the first charged particles.
地址 Kyoto JP