| 发明名称 |
ULTRASONIC TANK AND METHODS FOR UNIFORM GLASS SUBSTRATE ETCHING |
| 摘要 |
In some embodiments, an ultrasonic tank includes a container, an etching solution tank comprising a working area disposed within the container, and a plurality of ultrasonic transducers arranged about a perimeter of the etching solution tank in a configuration that provides a standard deviation of ultrasonic power within the working area of less than about 0.35. |
| 申请公布号 |
US2016035587(A1) |
申请公布日期 |
2016.02.04 |
| 申请号 |
US201514810967 |
申请日期 |
2015.07.28 |
| 申请人 |
CORNING INCORPORATED |
发明人 |
Keech John Tyler;Liu Stephen Kuo-Rui |
| 分类号 |
H01L21/48;C03C15/00 |
主分类号 |
H01L21/48 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An ultrasonic tank comprising:
a container; an etching solution tank comprising a working area disposed within the container; and a plurality of ultrasonic transducers arranged about a perimeter of the etching solution tank in a configuration that provides a standard deviation of ultrasonic power within the working area of less than about 0.35. |
| 地址 |
Corning NY US |
