发明名称 POSITION MEASURING METHOD, MISPLACEMENT MAP GENERATING METHOD, AND INSPECTION SYSTEM
摘要 In a position measuring method, a mask including first patterns to be transferred and second patterns not to be transferred is prepared. The position coordinates of the second patterns are measured with a position measuring apparatus and an inspection system. First position correction data is generated based on the position coordinates of the second patterns. A difference is obtained between the measured position coordinates of the second patterns and the first position correction data is corrected using the obtained difference. Second position correction data is generated from the corrected first position correction data. An optical image including the position coordinates of the first and second patterns is acquired. The position coordinates of the first patterns of the optical image are corrected using a difference between the position coordinates of the second patterns of the optical image and of the second patterns based on the second position correction data.
申请公布号 US2016034632(A1) 申请公布日期 2016.02.04
申请号 US201514814793 申请日期 2015.07.31
申请人 NuFlare Technology, Inc. 发明人 INOUE Hiromu
分类号 G06F17/50 主分类号 G06F17/50
代理机构 代理人
主权项 1. A position measuring method comprising: preparing a mask including a plurality of first patterns to be transferred to a subject and a plurality of second patterns not to be transferred to the subject; measuring position coordinates of the plurality of second patterns with a position measuring apparatus; measuring position coordinates of the plurality of second patterns with an inspection system; generating first position correction data based on the position coordinates of the plurality of second patterns measured with the inspection system; obtaining a difference between the position coordinates of the plurality of second patterns measured with the position measuring apparatus and the position coordinates of the plurality of second patterns measured with the inspection system; correcting the first position correction data using the obtained difference; generating second position correction data from the corrected first position correction data; acquiring an optical image including the position coordinates of the plurality of first patterns and the position coordinates of the plurality of second patterns; and correcting the position coordinates of the plurality of first patterns of the optical image using a difference between the position coordinates of the plurality of second patterns of the optical image and the position coordinates of the plurality of second patterns based on the second position correction data.
地址 Yokohama JP