发明名称 VAPOR DEPOSITION DEVICE, VAPOR DEPOSITION METHOD, AND ORGANIC EL ELEMENT
摘要 This vapor deposition device (11) is provided with: first and second vapor deposition sources (12) and (13); a common piping (27) that is connected to the first and second vapor deposition sources (12) and (13); a vapor deposition particle emission source (29) that is connected to the common piping (27) and emits vapor deposition particles from the first and second vapor deposition sources (12) and (13); an exhaust valve (32) that is connected to the vapor deposition particle emission source (29); and an exhaust pump (34) that is connected to the exhaust valve (32).
申请公布号 WO2016017538(A1) 申请公布日期 2016.02.04
申请号 WO2015JP71084 申请日期 2015.07.24
申请人 SHARP KABUSHIKI KAISHA 发明人 OCHI TAKASHI;KAWATO SHINICHI;KOBAYASHI YUHKI;MATSUNAGA KAZUKI;KIKUCHI KATSUHIRO;ICHIHARA MASAHIRO;MATSUMOTO EIICHI
分类号 C23C14/24;H01L51/50;H05B33/10 主分类号 C23C14/24
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