发明名称 NITRIDE SEMICONDUCTOR WAFER AND METHOD OF MANUFACTURING SAME
摘要 Provided is a nitride semiconductor wafer in which a luminescent layer having a multiple quantum well structure, comprising a regrown nitride semiconductor, and a p-type nitride semiconductor layer are stacked on one another above a nitride semiconductor template having a nitride semiconductor layer as its uppermost layer, wherein, if a well layer that is closest to the p-type nitride semiconductor layer, from among the well layers in the luminescent layer having a multiple quantum well structure, is defined as an uppermost well layer, then a distance t from a regrowth interface of the nitride semiconductor layer in the nitride semiconductor template to the uppermost well layer is at most equal to 1 µm, and the oxygen concentration in the uppermost well layer is at most equal to 5.0 × 1016 cm-3.
申请公布号 WO2016017506(A1) 申请公布日期 2016.02.04
申请号 WO2015JP70863 申请日期 2015.07.22
申请人 SUMITOMO CHEMICAL COMPANY, LIMITED 发明人 FUJIKURA HAJIME
分类号 H01L33/32;H01L33/06 主分类号 H01L33/32
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