STRUCTURES, METHODS AND APPLICATIONS FOR ELECTRICAL PULSE ANNEAL PROCESSES

摘要

Structures and methods are provided for nanosecond electrical pulse anneal processes. The method of forming an electrostatic discharge (ESD) N+/P+ structure includes forming an N+ diffusion on a substrate and a P+ diffusion on the substrate. The P+ diffusion is in electrical contact with the N+ diffusion. The method further includes forming a device between the N+ diffusion and the P+ diffusion. A method of annealing a structure or material includes applying an electrical pulse across an electrostatic discharge (ESD) N+/P+ structure for a plurality of nanoseconds.

主权项

1. An electrostatic discharge (ESD) N+/P+ structure comprising:
an N+ diffusion on a substrate; a P+ diffusion on the substrate and in electrical contact with the N+ diffusion; and a device between the N+ diffusion and the P+ diffusion, wherein the N+ diffusion and the P+ diffusion are in a side by side relationship.