Support Structure, Method of Controlling the Temperature Of The Same, and Apparatuses Including the Same

摘要

Disclosed are support structure apparatuses for holding a substrate or patterning device, for example in a lithographic apparatus, and apparatuses comprising such support structure apparatuses. The support structure apparatus comprises a temperature regulation system for controlling the temperature of the support structure and one or more temperature sensors located on the periphery of said support structure being operable to measure the temperature of the support structure at said periphery. The temperature regulation system may be operable to calculate an average temperature of the substrate holder from temperature values measured by said temperature sensors and position dependent correlation factors, which depend upon the position of an applied heat load on a substrate or patterning device mounted upon the support structure.

主权项

1. A support structure apparatus comprising:
a support structure for holding a substrate or patterning device; a temperature regulation system for controlling the temperature of the support structure; and one or more temperature sensors located on the periphery of said support structure and being operable to measure the temperature of the support structure at said periphery, wherein said temperature regulation system is operable to calculate an average temperature of the support structure from temperature values measured by said one or more temperature sensors, and wherein said average temperature of the su ort structure is calculated usin position dependent correlation factors, which are dependent on a position of an applied heat load on a substrate or patterning device mounted upon the support structure.