| 摘要 |
The invention provides a making method of photonasty substrate composition for shielding layer formation, and provides a high quality black matrix without generating pinholes. The making method of the photonasty substrate composition for shielding layer formation is characterized in that photonasty substrate constituent (A) is dissolved in organic solvent constituent (S); the obtained substrate solution is filtered by a PTFE film with pores under 1 micron, so pigment constituent (G) is dispersed in the substrate solution. The photonasty substrate constituent (A) contains alkali soluble resin (A1), light polymerism compound (A2) or light polymerism initiator (A3). |
