发明名称 CIGS膜の製法およびその製法を用いたCIGS太陽電池の製法
摘要 A CIGS film production method capable of suppressing oxidation of a front surface of a CIGS film, and a CIGS solar cell production method using the CIGS film production method includes the steps of: forming a first region having a Ga/(In+Ga) ratio progressively reduced as the thickness of the first region increases to a predetermined first thickness position from a back surface of the CIGS film; forming a second region having a Ga/(In+Ga) ratio progressively increased as the thickness of the second region increases to a predetermined second thickness position from the first region; and forming a third region on the second region by vapor-depositing Se and In, the third region having a Ga/(In+Ga) ratio progressively reduced toward a front surface of the CIGS film.
申请公布号 JP5851434(B2) 申请公布日期 2016.02.03
申请号 JP20130024575 申请日期 2013.02.12
申请人 日東電工株式会社 发明人 寺地 誠喜;渡邉 太一;西井 洸人;山本 祐輔;河村 和典;峯元 高志;チャンタナ ジャカパン
分类号 H01L31/0749;C01G15/00 主分类号 H01L31/0749
代理机构 代理人
主权项
地址