| 摘要 |
PROBLEM TO BE SOLVED: To provide: a resist composition excellent in coating properties, resolution, and lithographic properties; and a method of forming a resist pattern using the resist composition.SOLUTION: A resist composition includes a base component (A) whose solubility in a developing solution is changed by the action of an acid, an acid-generator component (B) which generates an acid upon exposure, and an organic solvent component (S). The organic solvent component (S) contains an organic solvent (S1) comprising a compound represented by the specified general formula (s-1). The base component (A) includes a resin component (A0) having a constitutional unit (a2) including either a cyclic group containing -SO-, a cyclic group containing a carbonate, or a cyclic group containing a lactone. (In the formula, X represents a single bond or an alkylene group having 1 to 3 carbon atoms, and n represents an integer from 0 to 3.) |
