发明名称 SINGLE PLATFORM WORK PIECE PROCESSING APPARATUS FOR DRY AND WET PROCESSING
摘要 According to the present invention, a single platform substrate-processing system for dry and wet processes performs dry and wet processes at a single platform, thereby preventing a substrate to be treated from being polluted and minimizing a bottom area of the system. In addition, the substrate-processing system of a single platform can reduce system construction costs or maintenance costs in comparison with a method of independently constituting and operating a dry processing system and a wet processing system. The single platform substrate-processing system includes: a front end module in which the substrate to be treated stands by; a dry processing module for dry-processing the substrate to be treated; a wet processing module for wet-processing the substrate to be treated; a first substrate transferring module for loading/unloading the substrate to be treated in/from the front end module; and a second substrate transferring module for receiving the substrate to be treated from the first substrate transferring module and loading the substrate to be treated to the dry processing module, unloading the dry-processed substrate to be treated from the dry processing module and loading the dry-processed substrate to be treated to the wet processing module, and unloading the wet-processed substrate to be treated and transferring the wet-processed substrate to be treated to the first substrate transferring module.
申请公布号 KR20160012367(A) 申请公布日期 2016.02.03
申请号 KR20140093679 申请日期 2014.07.24
申请人 CHOI, DO HYUN 发明人 CHOI, DO HYUN
分类号 H01L21/02;H01L21/302;H01L21/306;H01L21/3065;H01L21/677 主分类号 H01L21/02
代理机构 代理人
主权项
地址