| 摘要 |
The present invention relates to a plasma processing apparatus and an antenna assembly for the same. The antenna assembly for a plasma processing apparatus comprises: a first antenna part having a plurality of first antenna units connected in parallel and provided with resonant circuits; a second antenna part connected to the first antenna part in parallel and provided with a plurality of second antenna units connected in parallel and provided with resonant circuits; and a high frequency power source to supply high frequency power to the first and the second antenna part. According to the present invention, positions for installing divided antennae are considered to supply the high frequency power to minimize an error by a position to allow uniform control. Moreover, the divided antennae corresponding to unit areas can be individually adjusted to allow optimized control by considering positions in a chamber and a distribution of processing gas. |
