A PLASMA GENERATING MODULE AND PLASMA PROCESS APPARATUS COMPRISING THE SAME

摘要

Provided are a plasma generating module and a plasma processing apparatus including the same. The plasma generating module comprises: a power load receiving radio frequency (RF) power; a plurality of load units forming an inductive electric field by receiving the RF power, and divided into at least two load groups based on an impedance value; and at least two power distribution units arranged to be separated in a lengthwise direction on the power load, and connected to different load groups respectively to transfer the RF power, thereby making RF power applied to each antenna uniform to finally form uniform plasma.