发明名称 CHEMICALLY AMPLIFIED PHOTOSENSITIVE RESISN COMPOSITION AND METHOD OF REDUCING YELLOWING BY USING THE SAME
摘要 The present invention relates to a chemically amplified photosensitive resin composition and a method of reducing yellowing using the same. More particularly, the present invention relates to a photosensitive resin composition which has excellent sensitivity, hardness, and storage stability by comprising a binder resin including a repeat unit represented by chemical formula 1, a mineral acid generator, and a solvent, and to a method of reducing yellowing using the same. The photosensitive resin composition of the present invention has improved etching resistance and heat resistance compared to a conventional photosensitive resin composition comprising polyhydroxystyrene, and can improve a problem of degraded penetration capacity by suppressing yellowing phenomenon particularly in conditions of high temperature.
申请公布号 KR20160012385(A) 申请公布日期 2016.02.03
申请号 KR20140093719 申请日期 2014.07.24
申请人 DONGWOO FINE-CHEM CO., LTD. 发明人 CHOI, HAN YOUNG;IM, MIN JU;PARK, HAN WOO
分类号 G03F7/039;G03F7/40 主分类号 G03F7/039
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