| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technology allowing inspection on the basis of on an accurate position of an object to be inspected included in a substrate even when three-dimensional displacement occurs in the object to be inspected. <P>SOLUTION: The substrate inspection apparatus includes: movement controlling means for moving at least one of a holding reference position where a planar substrate including an object to be inspected and a measurement point is held and a focus position of a radiation generator so that a first irradiation direction and a second irradiation direction different in direction from each other of the substrate are irradiated with radiation; measurement point position specifying means for specifying a position of an intersection between a straight line connecting a relative focus position with a relative projection position when the substrate is irradiated with the radiation in the first irradiation direction, and a straight line connecting a relative focus position with a relative projection position when the substrate is irradiated with the radiation in the second irradiation direction, as a position of the measurement point; and inspection means for carrying out an inspection for the position of the object to be inspected which has been specified based on the position of the measurement point. <P>COPYRIGHT: (C)2013,JPO&INPIT |
