METHOD FOR A DIAMOND VAPOR DEPOSITION

摘要

The device comprises: a vacuum reactor (3) including a reaction chamber connected to a vacuum source; a substrate holder (5) arranged in the reactor; and a set of plasma sources arranged along a three-dimensional matrix in the reaction chamber. Each plasma source has an active zone in the reaction chamber, and a number of point sources is 80-320/m2> of a surface of the plasma, where the point sources of plasma are coaxial applicators (6). The coaxial applicators have, at their end located in the reaction chamber, a window to define the active zone. Independent claims are included for: (1) a method for depositing nanocrystalline diamond; and (2) a part obtained by the method.