METHOD FOR DETECTING DEFECT OF PATTERN

摘要

The present invention relates to a method to inspect a defect of a pattern, which is to easily inspect a defect formed on a substrate using a master image wherein a master substrate is photographed multiple times by an optical system and combined. The method to inspect the defect of a pattern comprises: a preparation step of preparing the master substrate wherein defect does not exist; a registration step of photographing different areas in the master substrate multiple times to combine photographed images and registering the photographed images as the master image; a photographing step of photographing an inspection area which is expected that there is a defect in a substrate to be inspected, at a same ratio as the master image by an optical system and registering the photographed image as an inspection image; and a matching step of searching the defect in the inspection area by matching the master image to the inspection image.