发明名称 感活性光線性又は感放射線性樹脂組成物、並びに、これを用いたレジスト膜、パターン形成方法、及び、電子デバイスの製造方法
摘要 There is provided an actinic ray-sensitive or radiation-sensitive resin composition, having: (A) a resin having a repeating unit represented by formula (I); (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a resin having at least one repeating unit (x) out of a repeating unit represented by formula (II) and a repeating unit represented by formula (III) and containing substantially neither fluorine atom nor silicon atom, wherein the content of the repeating unit (x) is 90% or more by mole based on all repeating units in the resin (C).
申请公布号 JP5850792(B2) 申请公布日期 2016.02.03
申请号 JP20120100181 申请日期 2012.04.25
申请人 富士フイルム株式会社 发明人 山口 修平;高橋 秀知;伊藤 純一;山本 慶
分类号 G03F7/039;C08F20/10;G03F7/004;G03F7/038;G03F7/32 主分类号 G03F7/039
代理机构 代理人
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