| 摘要 |
PURPOSE: A photosensitive resin composition is provided to apply the composition for forming a pattern or a coating layer for to an over-coat, a photo spacer, an insulating layer, and a control protrusion for a liquid crystal alignment. CONSTITUTION: A photosensitive resin composition contains a binder resin, a compound selected from the group consisting of compounds with carboxylic anhydride and more than two carboxyl groups, a photopolymerizable compound, and a photopolymerization initiator. The binder resin includes a monomer selected from the group consisting of unsaturated carboxylic acid and unsaturated carboxylic anhydride, and a monomer selected from the group consising monomers with cyclic ether groups with the carbon number of 2~4. |
