发明名称 Display device and electronic appliance
摘要 A display device with low manufacturing cost, with low power consumption, capable of being formed over a large substrate, with a high aperture ratio of a pixel, and with high reliability is provided. The display device includes a transistor electrically connected to a light-transmitting pixel electrode and a capacitor. The transistor includes a gate electrode, a gate insulating film over the gate electrode, and a first multilayer film including an oxide semiconductor over the gate insulating film. The capacitor includes the pixel electrode and a conductive electrode formed of a second multilayer film which overlaps with the pixel electrode with a predetermined distance therebetween, and has the same layer structure as the first multilayer film. A channel formation region of the transistor is at least one layer, which is not in contact with the gate insulating film, of the first multilayer film.
申请公布号 US9252287(B2) 申请公布日期 2016.02.02
申请号 US201514640410 申请日期 2015.03.06
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD 发明人 Yamazaki Shunpei
分类号 H01L29/10;H01L29/786;H01L27/12;H01L29/24;H01L29/417 主分类号 H01L29/10
代理机构 Robinson Intellectual Property Law Office 代理人 Robinson Intellectual Property Law Office ;Robinson Eric J.
主权项 1. A semiconductor device comprising: a transistor comprising: a first oxide layer on an insulating surface, a second oxide layer over the first oxide layer, and a third oxide layer over the second oxide layer; anda source electrode and a drain electrode electrically connected to the first oxide layer, the second oxide layer, and the third oxide layer; a silicon insulating layer containing excess oxygen over and in contact with the third oxide layer, the source electrode, and the drain electrode; a nitride insulating layer over the silicon insulating layer; anda capacitor comprising:a first electrode in contact with the silicon insulating layer; andthe nitride insulating layer overlapping the first electrode, wherein the first oxide layer, the second oxide layer, the third oxide layer, and the first electrode comprise a same material, and wherein the second oxide layer comprises a channel formation region of the transistor.
地址 Kanagawa-ken JP